Career Opportunities
MARORA
 

Process Applications

  • Nitridation

    • Nitridation of dielectric film

    Oxidation

    • Forming thin oxidation film
    • Selective oxidation
    • Anisotropic Oxidation
 

MARORA is the ideal tool for forming gate dielectric film to make next-generation DRAM, logic chips, and flash memory. Utilizing our proprietary plasma generation method (MMT*), MARORA generates plasma with low electron temperature (approx. 1eV) efficiently and achieves plasma damage-free processing.

*MMT=Modified Magnetron Typed

Features

  • High throughput Up to twice as productive as previous models
  • Equipped with MMT plasma source Generates highly uniform, low-electron temperature plasma on the surface of substrate (to 1eV)
  • Capable of wide-ranging temperature control Equipped with high temperature heater
  • Supports a wide range of applications Capable of "selective oxidation," in which silicone can be selectively oxidized without oxidizing metal, in addition to plasma oxidation and plasma nitridation