PRODUCTS
VERTRON Load Lock for 200mm Wafers

 

As semiconductor devices become more highly integrated and miniaturized, it is necessary to control native oxide film growth on the wafer surface at the time of loading for applications such as formation of contact Poly-Si, capacitor nitride, ultra thin oxidation and selective oxidation, etc.

Hitachi Kokusai Electric recommends Load Lock vertical Diffusion/LPCVD Systems, VERTRON-V, for these processes to utilize the unique oxygen free load lock chamber mounted directly underneath reactor tube.

The VERTRON-V series supports other emerging processes for the development of 0.10nm devices such as anneal steps for Cu interconnect.

 

Process Applications

  • Dry-Ox, Wet-Ox
  • NO(N2O)-Anneal
  • Selective-Ox
  • N2(Ar, H2)-Anneal
  • PH3-Anneal
  • Doped/Undoped-Poly-Si
  • Doped/Undoped-SiGe Poly
  • Si3N4
  • TEOS
  • HTO
 

Features

  • Native oxide free process by oxygen and moisture free load lock chamber mounted directly underneath reactor tube.

  • Greatly reduced contact resistance and effective thickness of capacitor
  • Reduced oxygen concentration level in Poly Si film which leads lower resistance after doping
  • Capability of control native oxide film growth by controlling oxygen concentration in a load lock chamber
  • Supports oxygen sensitive processes such as Selective Oxidation for Poly-Metal gate, SiGe Epi base formation and Cu/Low-k annealing process.
  • High throughput by providing large batch size
  • Maximum system uptime by self-cleaning capability.
  • High throughput by optional fast ramp heater element while maintaining low thermal budget.
  • Excellent yield and film thickness uniformity by optimized process conditions and clean air flow in loading area of the system.
  • Easy maintenance by heater element sliding mechanism.
  • Minimum overhead time by reliable and speedy wafer handling mechanisms. Wafer handling robot can transfers 5 wafers simultaneously.
  • High speed, reliable and low vibration cassette loading mechanisms.
  • Automatic filler dummy wafer supply by wafer detection mechanism at loading port.
  • SEMI standard compliant wafer I/O stage
  • Supports SMIF interface
  • Effective space utilization of side-by side layout by side access free design
  • User friendly GUI tube controller (CX3000 series) which supports process logging data analysis capability.
  • SECS/GEM compatibility for factory automation.
   *VERTRON is a registered trademark or a trademark of Hitachi Kokusai Electric, Inc.