PROCESS APPLICATIONS
 
 
  • Copper Anneal
  • Low Temperature Anneal
  • The TANDUO Anneal tool is Kokusai's new platform for Low Temperature Anneal Processes.

     
     
    TANDUO ANNEAL SYSTEM FEATURES
     
    • High Throughput 180wph
    • Good uniform, Good Repeatability
    • High Productivity Platform
    • High Reliability with Solid Aluminum Heater
    • Adjustable Height/Gap control by RECIPE
    • Bevel contact wafer lifter

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    *TANDUO is a registered trademark or a trademark of Hitachi Kokusai Electric, Inc.