PRODUCTS
QUIXACE V Load and Lock for 300mm Wafers

QUIXACE-V is Kokusai's new platform for vertical, batch LOAD-LOCK processing of 300 mm wafers. The QUIXACE-V offers throughput enhancements on core diffusion and LPCVD technologies through advances in temperature control, reactor purge, wafer handling automation, and temperature ramping.

QUIXACE-V achieves a load environment containing less than 1 ppm Oxygen and water vapor making it the ideal tool configuration for applications that require strict oxide-control for sensitive films such as contact poly-silicon layer, capacitor, ultra-thin gate-oxides, epi and Cu anneal.

Incorporating over 20 years of vertical, batch technology into one platform, Kokusai is proud to offer the QUIXACE as the new platform for today’s manufacturing environment and the solution tomorrow’s challenges.

Features

• Vacuum Load Lock Chamber for controlled atmosphere (high cleanliness and lower oxygen concentration).
• High Throughput (Max 125 wafers/batch)
• 300mm Wafer Capable
• Short Cycle Time for Process

 *QUIXACE is a registered trademark or a trademark of Hitachi Kokusai Electric, Inc.