MARORA is the best gate insulator film solution for the 65nm design rule of logic and flash memory devices.

MARORA’s MMT Plasma Nitridition System uses a unique "Modified Magnetron Type (MMT)" plasma source. Kokusai’s MMT technology high density and low electron temperature (<1eV) plasma provides a highly uniform nitridation process without damage to substrates.

Key Kokusai Advantages

• Multi-Process Single Chamber (In-situ Gate
• Oxide & Nitridation)
• Excellent Plasma Uniformity
• Improved Dielectric Constants
• Reduced Junction Leakage
• Excellent Carrier Mobility Results
• No Plasma Damage
• Low Temp Process (Room Temp to 700°C)