| MARORA is the best gate insulator film solution for the 65nm design rule of logic and flash memory devices.
MARORA’s MMT Plasma Nitridition System uses a unique "Modified Magnetron Type (MMT)" plasma source. Kokusai’s MMT technology high density and low electron temperature (<1eV) plasma provides a highly uniform nitridation process without damage to substrates.
Key Kokusai Advantages
- Multi-Process Single Chamber (In-situ Gate
- Oxide & Nitridation)
- Excellent Plasma Uniformity
- Improved Dielectric Constants
- Reduced Junction Leakage
- Excellent Carrier Mobility Results
- No Plasma Damage
- Low Temp Process (Room Temp to 700°C)
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