MARORA
 

Process Applications

  • Plasma Nitridation

    • Oxide Nitridation

    Plasma Oxidation

    • Gate Dielectric
    • Selective Oxidation
    • Anisotropic Oxidation
 
MARORA offers the best gate dielectric film solution for next generation advanced logic and memory devices. This tool uses a unique "modified magnetron typed (MMT)" plasma source. MMT technology produces both high density plasma and low electron temperature (<1eV) enabling a very uniform nitridation process free of plasma damage.

Features

  • High Throughput: Doubled productivity compared with conventional solutions
  • MMT Plasma Source: Excellent uniformity and very low electron temperature plasma at wafer surface (~1eV)
  • Wide Process Temperature Range: New high temperature heater
  • Expanded Process Applications: Selective oxidation (oxidize silicon without metal oxide formation)