This QUIXACE HTA (High Temperature Anneal) system is the best manufacturing solution for high-quality silicon substrate fabrication and high temperature device manufacturing processes.

1350°C is a typical temperature for high temperature annealing processes. Crystalline slip lines are easily induced on 300mm wafers processed at such high temperatures. This tool produces slip-free wafers at very high throughputs.

 

 
TYPICAL PROCESS APPLICATIONS
   
HTA (High Temperature Anneal)
  - High temperature Anneal .
  - Very high temperature Anneal(>1300°C)
 
 
HTA SYSTEM FEATURES

    Slip Free Even at 1350°C
    300mm Wafer Capable
    High Throughput Batch Processing
    Ultra-Clean Design Resulting in Low Metallic Contamination
* QUIXACE is a registered trademark or a trademark of Hitachi Kokusai Electric, Inc.