ANNEAL
 

Process Applications

  • High temperature Anneal
  • Very high temperature Anneal(>1300℃)
 

This tool offers the best manufacturing solution for high-quality silicon substrate fabrication and high temperature device manufacturing processes. 1350℃ is a typical temperature for high temperature annealing processes. Crystalline slip lines are easily induced on 300mm wafers processed at such high temperatures. This tool produces slip-free wafers at very high throughputs.

Features

  • Slip Free even at 1350℃
  • 300mm Wafer Capable
  • High Throughput Batch Processing
  • Ultra-Clean Design resulting in Low Metallic Contamination