The Kokusai BIO (Batch Isotropic Oxidation) system employs a new isotropic oxidation process developed by Kokusai that enables a simple furnace oxidation to be utilized for a variety of device applications. Further, the Kokusai solution employs a large batch approach to isotropic oxidation that provides the easiest maintenance and lowest CoO available.

One aspect of thermal oxidation that poses myriad challenges as devices shrink to 65nm and beyond is the propensity to deposit at different growth rates on different Si crystal orientations (<1-1-0> and <1-0-0>) and on different underlayer materials (i.e. poly Si and Si3N4). Another barrier in this device realm is the need to reduce processing temperatures as thermal budgets shrink along with the device geometries The QUIACE BIO system eiliminates these barries