EPITAXIAL
 

Process Applications

  • Silicon Epitaxy
  • Silicon Germanium Epitaxy
 

Hitachi Kokusai's new batch epitaxial system offers a cost-effective solution to SiGe/Si community. Employing a field-proven vacuum load lock platform, this tool produces a high crystalline quality epitaxial film which meets advanced device requirements while maintaining high throughput and low cost of ownership.

Features

  • High Productivity Batch Process
  • Low Temperature EPI Process
  • 300mm Wafer Capable
  • High Productivity and Reliability based on field proven batch platform