ADVANCED
 

Process Applications

  • Dielectric Films Process (Plan)
 

Hitachi Kokusai Electric is proud to introduce a novel, next generation deposition technique, Balance Controlled Deposition (BCD). The BCD technique provides lower temperature processing and tighter process control for advanced small geometry devices while maintaining very high productivity, which can benefit a wide range of users and process applications.

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BCD is a registered trademark of Hitachi Kokusai Electric Inc.

Features

  • Excellent step coverage
  • Precise Film Property Control
  • Low Temperature Deposition
  • Good uniformity
  • Low Contamination