Leading edge Kokusai product development programs are the foundation for support of our device customers’ advanced thin films needs. Kokusai is actively implementing production solutions at the 65nm node, demonstrating processes for the 45nm node and developing solutions for the 32nm node. Kokusai offers process solutions specifically adapted for Logic, MPU, Flash Memory and DRAM applications. Often, solutions developed for one device application are modified to support other device types.
Diffusion/LPCVD/Anneal Systems    
  Silicon Nitride Oxide
  Poly Silicon Thin Gate Oxide
  HTO Anneals
  TEOS







Recommended System Solutions

QUIXACE for 300mm wafers  
VERTRON for 200mm wafers