Kokusai’s array of low temperature nitride offerings includes Batch ALD Nitride and CVD Nitride. Many IC manufacturers are employing organic based low temperature silicon nitride solutions in order to reduce process temperature while avoiding drastic reductions in deposition rate. Kokusai has over five years of organic precursor Nitride experience. This experience is reflected in our tool configurations,
in-situ gas cleans, scheduled downtime reduction strategies, and process understanding.
Our CVD Nitrides are performed in our standard 200mm
VERTRON and 300mm QUIXACE vertical batch reactors, utilizing standard LPCVD temperature and pressure regimes. Another approach to thinner low temperature Nitrides is Atomic Layer Deposition (ALD). Using its well established 200mm and 300mm vertical batch platforms, Kokusai optimized the reactor design and gas switching technology to create our ALDINNA batch ALD system which achieves the fast and uniform precursor distribution that is essential to an ALD process and superior film qualities.
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