APPLICATIONS
Low Temperature Nitrides

Kokusai’s array of low temperature nitride offerings includes BCD Nitride and CVD Nitride. Many IC manufacturers are employing organic based low temperature silicon nitride solutions in order to reduce process temperature while avoiding drastic reductions in deposition rate. Kokusai has over five years of organic precursor Nitride experience. This experience is reflected in our tool configurations, in-situ gas cleans, scheduled downtime reduction strategies, and process understanding.

Process
Kokusai System Advantages
CVD and Silicon Nitride
  • Set-up and design expertise
  • Liquid source and unique plumbing requirements
  • Cleaning: routines and frequencies
  • Reduced installation and start-up time
BCD Silicon Nitride
  • Unique stress engineering and control techniques
  • Less loading effect (less pattern dependency)
  • Excellent step coverage: >98% (Aspect Ratio 1:3)
  • Low Si-H concentration
  • Excellent thickness uniformity
  • High throughput: ~30wph (30nm)

Recommended Products

QUIXACE BCD Batch Controlled Deosition
QUIXACE for 300mm
VERTRON for 200mm