Kokusai Semiconductor Equipment Corporation Home

Kokusai Semiconductor Equipment Corporation (KSEC) provides comprehensive North American operations for its parent company, Hitachi Kokusai Electric - a premiere global supplier of Semiconductor Manufacturing Equipment. KSEC is headquartered in San Jose, California and has a strategic parts, service and training facility in Vancouver, Washington.

A full range of service and support options for maximizing productivity... (more)

Both online and classroom training as wel as custom tailored courses...(more)

BATCH SYSTEMS

QUIXACE 300 MM WAFER SYSTEMS
The Batch Thermal Process system
offers high throughput by utilizing advanced technologies in such areas as temperature control, wafer handling automation, reactor purging, and temperature ramping... (more)

200 MM WAFER SYSTEMS

VERTRON 200 MM SYSTEM
Hitachi Kokusai’s Thermal Technology featuring:
- High-Temp. Oxidation for SiC wafers
- Ultra High-Temp. Anneal for SiC wafers ... (more)

SINGLE WAFER SYSTEMS

MARORA -Single Wafer Plasma Nitridation / Oxidation System. MARORA offers the best gate dielectric film solution for next generation advanced logic and memory devices... (more)

TΛNDUO -Single Wafer Plasma Dry Strip System offers dramatically improved throughput using a totally redesigned platform features an ultra high speed ashing process solution... (more)

BATCH PROCESS CONFIGURATIONS

The Balance Controlled Deposition (BCD) System provides lower temperature processing and tighter process control for advanced small geometry devices while maintaining very high productivity... (more)

The HTA ( High Temperature Anneal) system offers the best manufacturing solution for high-quality silicon substrate fabrication and high temperature device manufacturing processes... (more)

The BES (Batch Epitaxial System)
system is Hitachi Kokusai's new batch epitaxial system offers a cost-effective solution for SiGe/Si employing a field-proven vacuum load lock platform... (more)

The BIO (Batch Isotropic Oxidation)
system employs a new isotropic oxidation process developed by Kokusai that enables a simple furnace oxidation to be utilized for a variety of device applications... (more)

TΛNDUO -Anneal system offers .... (more)

QUICK View of Processes and Applications